Papers: 10.3390/mi7070118

https://doi.org/10.3390/mi7070118

Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review

Cited by: 39
Author(s): Changtao Wang, Wei Zhang, Zeyu Zhao, Yanqin Wang, Ping Gao, Yanhong Luo, Xiangang Luo
Published: about 10 years ago

Software Mentions 1

cran: EMT
Exact Multinomial Test: Goodness-of-Fit Test for Discrete Multivariate Data
Papers that mentioned: 108
Very Likely Science (85)