Papers: 10.3390/mi7070118
https://doi.org/10.3390/mi7070118
Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review
Cited by: 39
Author(s): Changtao Wang, Wei Zhang, Zeyu Zhao, Yanqin Wang, Ping Gao, Yanhong Luo, Xiangang Luo
Published: about 9 years ago
Software Mentions 1
cran: EMT
Exact Multinomial Test: Goodness-of-Fit Test for Discrete Multivariate DataPapers that mentioned: 108
Very Likely Science (85)