Papers: 10.3390/ijerph18042071

https://doi.org/10.3390/ijerph18042071

Is There a Sampling Bias in Research on Work-Related Technostress? A Systematic Review of Occupational Exposure to Technostress and the Role of Socioeconomic Position

Cited by: 10
Author(s): Prem Borle, Kathrin Reichel, Susanne Voelter‐Mahlknecht
Published: over 5 years ago

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