Papers: 10.1080/14686996.2019.1599694

https://doi.org/10.1080/14686996.2019.1599694

New development of atomic layer deposition: processes, methods and applications

Cited by: 259
Author(s): Peter Ozaveshe Oviroh, Rokhsareh Akbarzadeh, Dongqing Pan, Rigardt Alfred Maarten Coetzee, Tien‐Chien Jen
Published: over 7 years ago

Software Mentions 1