Papers: 10.1038/s41378-019-0101-2

https://doi.org/10.1038/s41378-019-0101-2

Displacement Talbot lithography for nano-engineering of III-nitride materials

Cited by: 33
Author(s): Pierre-Marie Coulon, B. Damilano, Blandine Alloing, Pierre Chausse, Sebastian Walde, Johannes Enslin, R. L. Armstrong, S. Vézian, Sylvia Hagedorn, Tim Wernicke, J. Massies, Jesús Zúñiga‐Pérez, M. Weyers, Michael Kneissl, P. A. Shields
Published: almost 7 years ago

Software Mentions 1